IPV3000 third generation photovoltaic ion implantation equipment(2017-) high beam ion source to maintain the belt horizontal transfer of silicon and phosphorus ion source solid improvement, beam 40% i
IPV2000 second generation photovoltaic ion implantation equipment (2014 - 2017) omits quality analysis, uses belt level transfer silicon, eliminates costly phosphorus, and uses cheap solid phosphorus
Ion implantation, the process of doping a semiconductor and thereby changing the semiconductor properties, has been widely used in integrated circuit (IC) industry. The ion implanter, the tool that is
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